Directed self-assembly of Ge nanostructures on very high index, highly anisotropic Si(hkl) surfaces

Nano Lett. 2005 Feb;5(2):369-72. doi: 10.1021/nl048340w.

Abstract

Families of very high-index planes, such as those which bifurcate spontaneously to form a hill-and-valley structure composed of opposing facets, provide natural templates for the directed growth of position-controlled self-organized nanostructures with shapes determined by the facet width ratio R. For example, deposition of a few ML of Ge on Si(173 100 373), corresponding to R(113/517) = 1.7, results in a field of 40-nm-wide Ge nanowires along [72 187] with a uniform period of 60 nm.

Publication types

  • Evaluation Study
  • Research Support, U.S. Gov't, Non-P.H.S.

MeSH terms

  • Anisotropy
  • Crystallization / methods*
  • Germanium / chemistry*
  • Materials Testing
  • Molecular Conformation
  • Nanostructures / chemistry*
  • Nanostructures / ultrastructure*
  • Nanotechnology / methods*
  • Silicon / chemistry*
  • Surface Properties

Substances

  • Germanium
  • Silicon