Secondary ion mass spectrometry and X-ray photoelectron spectroscopy investigation on chemical vapor deposited CeO(2-)ZrO(2)-TiO(2) thin films

Simona Barison; Davide Barreca; Giovanni A Battiston; Sergio Daolio; Monica Fabrizio; Rosalba Gerbasi; Eugenio Tondello

doi:10.1002/rcm.1014

Secondary ion mass spectrometry and X-ray photoelectron spectroscopy investigation on chemical vapor deposited CeO(2-)ZrO(2)-TiO(2) thin films

Rapid Commun Mass Spectrom. 2003;17(9):996-1001. doi: 10.1002/rcm.1014.

Authors

Simona Barison¹, Davide Barreca, Giovanni A Battiston, Sergio Daolio, Monica Fabrizio, Rosalba Gerbasi, Eugenio Tondello

Affiliation

¹ Istituto per l'Energetica e le Interfasi, CNR, Corso Stati Uniti 4, 35127 Padova, Italy. s.barison@ieni.cnr.it

PMID: 12717775
DOI: 10.1002/rcm.1014

Abstract

Mixed CeO(2)-ZrO(2) systems have attracted widespread interest for their use in three-way catalyst (TWC) technology for automotive exhaust conversion to non-toxic products. In this work, CeO(2)-ZrO(2) thin films were deposited, via chemical vapor deposition, in order to obtain nanoscale materials with a high surface-to-volume ratio, with precise control of system properties. The addition of TiO(2) as buffer layer was also investigated. Cordierite was chosen as substrate, being the usual refractory material for catalytic mufflers. The multilayers were characterized by scanning electron microscopy, X-ray photoelectron spectroscopy (XPS) and secondary ion mass spectrometry (SIMS). In particular, the combination of SIMS and XPS allowed us to investigate both surface and in-depth chemical composition, studying also film-intermixing phenomena induced by annealing processes.