Photochemical properties of ofloxacin involved in oxidative DNA damage: a comparison with rufloxacin

Chem Res Toxicol. 2003 Apr;16(4):562-70. doi: 10.1021/tx034006o.

Abstract

Photodegradation of ofloxacin (OFX) under aerobic conditions gives rise to N-demethylation, mainly involving coupling of radical cation OFX(*)(+ )()with superoxide radical anion. Although H(2)O(2) is produced as a byproduct, oxidative damage to DNA to give 8-OH-dGuo is associated with a type II mechanism. When the photosensitizing potentials of OFX and rufloxacin (RFX) are compared under the same conditions, the latter is shown to produce a much higher degree of DNA oxidation despite the close structural similarity. This is explained by a decrease of the triplet energy when sulfur instead of oxygen is attached to position 8 of the fluoroquinolone ring system. As a consequence, phosphate anions are able to quench OFX triplet but not RFX triplet; this reveals that the reaction medium has a strong influence on the photochemistry of OFX and hence on its photobiological properties.

Publication types

  • Comparative Study
  • Research Support, Non-U.S. Gov't

MeSH terms

  • Anti-Bacterial Agents / chemistry
  • Anti-Bacterial Agents / radiation effects*
  • DNA Damage*
  • Fluorescence
  • Fluoroquinolones / chemistry
  • Fluoroquinolones / radiation effects*
  • Hydrogen Peroxide / chemistry
  • Lasers
  • Ofloxacin / chemistry
  • Ofloxacin / radiation effects*
  • Oxidation-Reduction
  • Photochemistry
  • Quinolones / chemistry
  • Quinolones / radiation effects*
  • Time Factors

Substances

  • Anti-Bacterial Agents
  • Fluoroquinolones
  • Quinolones
  • Ofloxacin
  • Hydrogen Peroxide
  • rufloxacin