Optical design of a stigmatic extreme-ultraviolet spectroscopic system for emission and absorption studies of laser-produced plasmas

Appl Opt. 2002 Jan 1;41(1):172-81. doi: 10.1364/ao.41.000172.

Abstract

The design of a stigmatic spectroscopic system for diagnostics of laser-produced plasmas in the 2.5-40-nm region is presented. The system consists of a grazing-incidence toroidal mirror that focuses the radiation emitted by a laser-produced plasma onto the entrance slit of a spectrograph. The latter has a grazing-incidence spherical variable-line-spaced grating with flat-field properties coupled to a spherical focusing mirror that compensates for the astigmatism. The mirror is crossed with respect to the grating; i.e., it is mounted with its tangential plane coincident with the equatorial plane of the grating. The spectrum is acquired by an extreme-UV- (EUV-) enhanced CCD detector with high quantum efficiency. This stigmatic design also has spectral and spatial resolution capability for extended sources: The spectral resolution is also preserved for off-plane points, whereas the spatial resolution decreases for points far from the optical axis. The expected performance is presented and compared with that of a stigmatic design with a plane variable-line-spaced grating illuminated in converging light.